In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...
Samco has announced that its plasma etching system, the RIE-400iP, has been selected by the Technical University of Denmark ...
Plasma Etch Inc. has released its fully automated plasma cleaner, the PE-25-jw. The unit, priced at $6,900, is equipped with a programmable logic controller and a single gas channel, with an option of ...
Silicon wafers aren't the only things that lose material in the various etching steps of IC manufacturing. The clamp rings which hold the wafers also erode during the process. Plastic clamp rings are ...
A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS₂), a next-generation ...
Akara® Solves Key Scaling Challenges for Chipmakers, with Unique Plasma Control Capabilities and a Suite of Proprietary New Technologies; Extends 20 years of Conductor Etch Leadership FREMONT, Calif., ...
Quadrupole mass-spectroscopy has reported significant neutral and ionic species in the unique C 5 HF 7 /O 2 /Ar plasma, including C x F y (X>2), C x HF y, and C x F y (Y/X<2). Using C 5 HF 7 /O 2 /Ar ...
Deep inside your smartphone are a handful of interesting miniature electromechanical devices. The accelerometer is a MEMS device, and was produced with some of the most impressive industrial processes ...
The PE-100 Convertible plasma system incorporates reactive ion etching and isotropic etching/cleaning technologies into a stand-alone benchtop system. The all aluminum chamber has over 240 in. 2 of ...
AUSTIN, Texas — Tokyo Electron Ltd. (TEL) has improved the design of the SCCM (Super Capacitively Coupled Module) plasma etch chamber, the company claimed Monday (Dec. 13). The focus ring and ...
What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results